JPH0537470Y2 - - Google Patents
Info
- Publication number
- JPH0537470Y2 JPH0537470Y2 JP6674490U JP6674490U JPH0537470Y2 JP H0537470 Y2 JPH0537470 Y2 JP H0537470Y2 JP 6674490 U JP6674490 U JP 6674490U JP 6674490 U JP6674490 U JP 6674490U JP H0537470 Y2 JPH0537470 Y2 JP H0537470Y2
- Authority
- JP
- Japan
- Prior art keywords
- processing chamber
- wafer
- processing
- mounting table
- passage space
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6674490U JPH0537470Y2 (en]) | 1990-06-26 | 1990-06-26 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6674490U JPH0537470Y2 (en]) | 1990-06-26 | 1990-06-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0426526U JPH0426526U (en]) | 1992-03-03 |
JPH0537470Y2 true JPH0537470Y2 (en]) | 1993-09-22 |
Family
ID=31599712
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6674490U Expired - Lifetime JPH0537470Y2 (en]) | 1990-06-26 | 1990-06-26 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0537470Y2 (en]) |
-
1990
- 1990-06-26 JP JP6674490U patent/JPH0537470Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH0426526U (en]) | 1992-03-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3388628B2 (ja) | 回転式薬液処理装置 | |
KR20050122194A (ko) | 도포장치 | |
JPH0451907Y2 (en]) | ||
JPH0537470Y2 (en]) | ||
JP3826719B2 (ja) | 基板処理装置及び基板処理方法 | |
US5785759A (en) | Rotating cup type liquid supply device | |
JP2001110714A (ja) | 薬液塗布装置および薬液塗布方法 | |
JPS63141670A (ja) | 回転塗布装置 | |
JP2906783B2 (ja) | 処理装置 | |
JP3033008B2 (ja) | 処理方法及び処理装置 | |
JPH07211685A (ja) | スピンナー洗浄装置 | |
JP3628830B2 (ja) | 塗布装置 | |
JPH0361510B2 (en]) | ||
JPS6342526Y2 (en]) | ||
JPH0465115A (ja) | 不要レジスト除去装置 | |
JP3859370B2 (ja) | 塗布装置 | |
JPS6334929A (ja) | 半導体製造装置 | |
JPH07275780A (ja) | 回転カップ式処理装置 | |
JPH0262549A (ja) | スピンデベロッパ、レジスト処理装置及びレジスト処理方法 | |
JPH04146615A (ja) | 半導体生成工程の回転カツプ式薬液処理装置 | |
JPH01238122A (ja) | 半導体製造装置 | |
KR100235103B1 (ko) | 현상장치 및 현상방법(developing apparatus and developing method) | |
JP3780104B2 (ja) | 塗布装置及び塗布方法 | |
JP2668548B2 (ja) | 半導体製造装置及び処理装置及び処理方法 | |
JPH03245869A (ja) | 薬液塗布装置の吐出薬液劣化防止機構 |